Method of manufacturing mask

专利名称：Method of manufacturing mask发明人：Sung-Gon Jung,Gi-Sung Yeo,Young-Mi

Lee,Han-Ku Cho

申请号：US11590244申请日：20061031公开号：US07539970B2公开日：20090526

专利附图：

摘要：A method of manufacturing a mask includes designing a second mask datapattern for forming a first mask data pattern, creating a first emulation pattern, which isdetermined from the second mask data pattern, using a first emulation, creating a

second emulation pattern, which is determined from the first emulation pattern, using asecond emulation, comparing a pattern, in which the first and second emulation patternsoverlap, with the first mask data pattern, and manufacturing a mask layer, whichcorresponds to the second mask data pattern, according to results of the comparison.

申请人：Sung-Gon Jung,Gi-Sung Yeo,Young-Mi Lee,Han-Ku Cho

地址：Seoul KR,Seoul KR,Seoul KR,Seongnam-si KR

国籍：KR,KR,KR,KR

代理机构：F.Chau & Associates, LLC

更多信息请下载全文后查看